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SCC-200
Κωδικός προϊόντος: SCC-200
Κατασκευαστής: Novocontrol Διαθέσιμο
Top-Class Microprocessor- Controlled Spin Coater:
- Rotational Speed up to 12.000 rpm
- 2 Rotational Speed Ramps
- Programmable Ramp Duration: 3 s .. 600 s
- 2 Rotational Speed Target Values
- Programmable Dwell Time: 3 s .. 600 s
- Alphanumeric Four-Line Display (20 Characters/ Line)
- 10 Rotational Speed Sequences Storable in Non-Volatile Memory
- Display of Remaining Processing Time
- Total Process Times: 12 s .. 40 Minutes
- Active Vacuum Suction of the Sample
- Film Thickness Range 10 nm to 10 µm
- Easy-to-Use & Maintenance Free Design
- Rotational Platforms for Substrates up to 90 mm Diameter
Για περισσότερες πληροφορίες πατήστε εδώ.
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Διαθέσιμο
Top-Class Microprocessor- Controlled Spin Coater:
- Rotational Speed up to 12.000 rpm
- 2 Rotational Speed Ramps
- Programmable Ramp Duration: 3 s .. 600 s
- 2 Rotational Speed Target Values
- Programmable Dwell Time: 3 s .. 600 s
- Alphanumeric Four-Line Display (20 Characters/ Line)
- 10 Rotational Speed Sequences Storable in Non-Volatile Memory
- Display of Remaining Processing Time
- Total Process Times: 12 s .. 40 Minutes
- Active Vacuum Suction of the Sample
- Film Thickness Range 10 nm to 10 µm
- Easy-to-Use & Maintenance Free Design
- Rotational Platforms for Substrates up to 90 mm Diameter
Για περισσότερες πληροφορίες πατήστε εδώ.
